基于有限元仿真的立式炉隔热结构改进与传热分析

Thermal insulation structure improvement and heat transfer analysis of vertical furnace based on finite element simulation

中文关键词: 立式炉  有限元仿真  隔热结构  温度均匀性  热补偿

英文关键词: vertical furnace  finite element simulation  thermal insulation structure  temperature uniformity  thermal compensation

中文摘要:

      针对立式薄膜沉积炉在高温工艺中因非对称热耗散导致的晶圆径向温差问题，提出一种基于多物理场耦合仿真的隔热结构改进方法。通过建立二维轴对称传热模型，系统分析了炉腔上下端晶圆边缘与中心温差形成机理。基于热补偿策略，差异化设计隔热结构参数——上端采用200/300 mm双直径隔热板组合，下端采用环形掏空隔热板与减量布局方案。结果表明：改进后，上下端晶圆径向温差分别由1.28℃和2.89℃减小至0.45℃和0.44℃，全晶圆温差相对改善84.71%，实现总温差≤1℃的工艺目标。

英文摘要:

      Aiming at the radial temperature difference of wafers in vertical film deposition furnaces caused by asymmetric heat dissipation during high-temperature processes, this paper proposes an improved method for the insulating structure of film deposition furnace based on multi-physics coupling simulation. By estab-lishing a 2D axisymmetric heat transfer model, the mechanism of temperature difference between the edge and center of wafers at the upper and lower ends of the furnace chamber is systematically analyzed. Based on the thermal compensation strategy, the insulating structure parameters are differentially designed: a du-al-diameter insulating plate combination of 200/300 mm is used at the upper end, and a ring-shaped hollow insulating plate and a reduced layout scheme at the lower end. The results show that after the improvement, the radial temperature difference of wafers at the upper and lower ends is reduced from 1.28℃ and 2.89℃ to 0.45℃ and 0.44℃, respectively. The temperature difference of the whole wafer is improved by 84.71% relatively, and the total temperature difference is controlled within 1℃ to meet the process target.